- Fabrication of nanowires with high aspect ratios utilized by dry etching with SF6:C4F8 and self-limiting thermal oxidation on Si substrate
[作者：Park, SY; Di Giacomo, SJ; Anisha, R; Berger, PR; Thompson, PE; Adesida, I,期刊：Journal Of Vacuum Science & Technology B, 页码：763-768 , 文章类型： Article，,卷期：2010年28-4]
- Si-based nanowires with high aspect ratios have been fabricated using an inductively coupled plasma reactive ion etching (ICP-RIE) with a continuous processing gas mixture of fluorine-based SF6:C4F8 combined with a therm...
- Germanium surface hydrophilicity and low-temperature Ge layer transfer by Ge-SiO2 bonding
[作者：Ma, XB; Liu, WL; Du, XF; Liu, XY; Song, ZT; Lin, CL; Chu, PK,期刊：Journal Of Vacuum Science & Technology B, 页码：769-774 , 文章类型： Article，,卷期：2010年28-4]
- Wafer bonding and layer transfer are two fundamental technologies in the fabrication of advanced microsystems. In the authors' experiments, prior to Ge wafer bonding, the hydrophilicity of the germanium surface after wet...
- Novel technique for formation of metal lines by functional liquid containing metal nanoparticles and reduction of their resistivity by hydrogen treatment
[作者：Kieu, TT; Ohdaira, K; Shimoda, T; Matsumura, H,期刊：Journal Of Vacuum Science & Technology B, 页码：775-782 , 文章类型： Article，,卷期：2010年28-4]
- A novel technique for formation of metal lines for electronic devices, and for reduction of resistivity in such metal lines, is proposed. In the technique, the metal lines are formed in trenches by using functional liqui...
- Dual exposure, two-photon, conformal phase mask lithography for three dimensional silicon inverse woodpile photonic crystals
[作者：Shir, DJ; Nelson, EC; Chanda, D; Brzezinski, A; Braun, PV; Rogers, JA; Wiltzius, P,期刊：Journal Of Vacuum Science & Technology B, 页码：783-788 , 文章类型： Article，,卷期：2010年28-4]
- The authors describe the fabrication and characterization of three dimensional silicon inverse woodpile photonic crystals. A dual exposure, two-photon, conformal phasemask technique is used to create high quality polymer...
- High sheet resistance, low temperature coefficient of resistance resistor films for integrated circuits
[作者：Wright, SW; Judge, CP; Lee, MJ; Bowers, DF; Dunbar, M; Wilson, CD,期刊：Journal Of Vacuum Science & Technology B, 页码：834-840 , 文章类型： Article，,卷期：2010年28-4]
- High resistance, low temperature coefficient of resistance (TCR) thin-film resistors have been produced by rf sputtering from compound targets using the Cr-Si-B-SiO2/Al2O3 material system. After postdeposition annealing ...
- Effects of argon ion bombardment on the structure and magnetic properties of ultrathin Fe films
[作者：Ramaswamy, S; Gopalakrishnan, C; Ganesh, KR; Jeganathan, K; Ponnavaikko, M,期刊：Journal Of Vacuum Science & Technology B, 页码：795-798 , 文章类型： Article，,卷期：2010年28-4]
- Modifications of structural, compositional, and magnetic properties of ultrathin Fe/Si bilayer films induced by Ar+ ion bombardment have been studied. The films were grown at room temperature using an electron beam evapo...
- Newly developed electron beam stepper for nanoimprint mold fabrication
[作者：Okada, M; Kishiro, T; Yanagihara, K; Ataka, M; Anazawa, N; Matsui, S,期刊：Journal Of Vacuum Science & Technology B, 页码：740-743 , 文章类型： Article，,卷期：2010年28-4]
- The nanoimprint molds are usually fabricated by electron beam (EB) lithography. In recent years, a large-area mold fabrication with a high throughput is required to use nanoimprint lithography to produce devices in mass ...
- In situ direct visualization of irradiated electron-beam patterns on unprocessed resists using atomic force microscopy
[作者：Koop, H; Zech, M; Karrai, K; Schnurbusch, D; Muller, M; Grundl, T; Amann, MC; Holleitner, AW,期刊：Journal Of Vacuum Science & Technology B, 页码：802-805 , 文章类型： Article，,卷期：2010年28-4]
- The authors introduce an in situ characterization method of resists used for electron-beam lithography. The technique is based on the application of an atomic force microscope, which is directly mounted below the cathode...
- Novel planarizing scheme for patterned media
[作者：Poh, WCA; Tan, HK; Ong, LT; Hui, HK; Wong, SK; Aung, KO; Tan, E; Sbiaa, R; Kay, YS; Piramanayagam, SN,期刊：Journal Of Vacuum Science & Technology B, 页码：806-808 , 文章类型： Article，,卷期：2010年28-4]
- A novel planarization scheme, consisting of compression of a low glass transition temperature (T-g) and low viscosity poly(methyl methacrylate) (PMMA) polymer into grooves of patterned recording media using a surface wit...
- Residue growth on metallic-hard mask after dielectric etching in fluorocarbon-based plasmas. I. Mechanisms
[作者：Posseme, N; Chevolleau, T; Bouyssou, R; David, T; Arnal, V; Barnes, JP; Verove, C; Joubert, O,期刊：Journal Of Vacuum Science & Technology B, 页码：809-816 , 文章类型： Article，,卷期：2010年28-4]
- This work focuses on the formation of residues that grow on a metallic-hard mask after etching of porous low-k materials in fluorocarbon-based plasmas. The residue growth, which is dependent on the air exposure time afte...
- Polythiophene-based charge dissipation layer for electron beam lithography of zinc oxide and gallium nitride
[作者：Dylewicz, R; Lis, S; De La Rue, RM; Rahman, F,期刊：Journal Of Vacuum Science & Technology B, 页码：817-822 , 文章类型： Article，,卷期：2010年28-4]
- The ability of thin polythiophene layers to dissipate accumulated charge in the electron beam lithography (EBL) of wide bandgap semiconductors, such as zinc oxide and gallium nitride, is demonstrated. A quick and inexpen...
- All-inorganic thermal nanoimprint process
[作者：Weiss, DN; Meyers, ST; Keszler, DA,期刊：Journal Of Vacuum Science & Technology B, 页码：823-828 , 文章类型： Article，,卷期：2010年28-4]
- The authors describe a nanoimprint method for an all-inorganic resist material, aluminum oxide phosphate. The resist is free of organic additives, water-based, environmentally benign and yields dense, amorphous, crack-, ...
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