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High sheet resistance, low temperature coefficient of resistance resistor films for integrated circuits

  作者 Wright, SW; Judge, CP; Lee, MJ; Bowers, DF; Dunbar, M; Wilson, CD  
  选自 期刊  Journal Of Vacuum Science & Technology B;  卷期  2010年28-4;  页码  834-840  
  关联知识点  
 

[摘要]High resistance, low temperature coefficient of resistance (TCR) thin-film resistors have been produced by rf sputtering from compound targets using the Cr-Si-B-SiO2/Al2O3 material system. After postdeposition annealing at 450-550 degrees C sheet resistan

 
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