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Newly developed electron beam stepper for nanoimprint mold fabrication

  作者 Okada, M; Kishiro, T; Yanagihara, K; Ataka, M; Anazawa, N; Matsui, S  
  选自 期刊  Journal Of Vacuum Science & Technology B;  卷期  2010年28-4;  页码  740-743  
  关联知识点  
 

[摘要]The nanoimprint molds are usually fabricated by electron beam (EB) lithography. In recent years, a large-area mold fabrication with a high throughput is required to use nanoimprint lithography to produce devices in mass production. Using a conventional EB

 
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