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  • Mechanical cleaning of graphene - art. no. 073110
    [作者:Goossens, AM; Calado, VE; Barreiro, A; Watanabe, K; Taniguchi, T; Vandersypen, LMK,期刊:Applied Physics Letters, 页码:73110-73110 , 文章类型: Article,,卷期:2012年100-7]
  • Contamination of graphene due to residues from nanofabrication often introduces background doping and reduces electron mobility. For samples of high electronic quality, post-lithography cleaning treatments are therefore ...