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文章名     作者     期刊名     摘要     卷     期         如果没有找到您所需要的文献，请点击 ——此处申请     共180条记录   Benchmarking of 50 nm features in thermal nanoimprint [作者：Gourgon, C; Chaix, N; Schift, H; Tormen, M; Landis, S; Torres, CMS; Kristensen, A; Pedersen, RH; Christiansen, MB; Fernandez-Cuesta, I; Mendels, D; Montelius, L; Haatainen, T,期刊：Journal Of Vacuum Science & Technology B, 页码：2373-2378 , 文章类型： Article，,卷期：2007年25-6] The objective of this benchmarking is to establish a comparison of several tools and processes used in thermal NIL with Si stamps at the nanoscale among the authors' laboratories. The Si stamps have large arrays of 50 nm... Coarse-grain simulation of viscous flow and stamp deformation in nanoimprint [作者：Sirotkin, V; Svintsov, A; Zaitsev, S; Schift, H,期刊：Journal Of Vacuum Science & Technology B, 页码：2379-2383 , 文章类型： Article，,卷期：2007年25-6] A refined coarse-grain software for the simulation of thermal nanoimprint lithography is described. This software takes into account the stamp bending during squeeze flow and is able to provide results well suited for th... Imaging layers for the directed assembly of block copolymer films: Dependence of the physical and chemical properties of patterned polymer brushes on brush molecular weight [作者：Stuen, KO; In, I; Han, E; Streifer, JA; Hamers, RJ; Nealey, PF; Gopalan, P,期刊：Journal Of Vacuum Science & Technology B, 页码：1958-1962 , 文章类型： Article，,卷期：2007年25-6] The directed assembly of polystyrene-block-poly(methyl methacrylate) films using chemically nanopatterned polymer brush surfaces with various molecular weights was investigated. The brushes (3-10 nm in thickness) were ma... Pattern transfer using poly(styrene-block-methyl methacrylate) copolymer films and reactive ion etching [作者：Liu, CC; Nealey, PF; Ting, YH; Wendt, AE,期刊：Journal Of Vacuum Science & Technology B, 页码：1963-1968 , 文章类型： Article，,卷期：2007年25-6] Self-assembly block copolymers have drawn a lot of attention for its great potential on critical dimension (CD) control and line-edge roughness (LER) reduction, which become more and more crucial as the CD of transistors... Fabrication of three-dimensional structures of resist by proton beam writing [作者：Furuta, Y; Uchiya, N; Nishikawa, H; Haga, J; Sato, T; Oikawa, M; Ishii, Y; Kamiya, T,期刊：Journal Of Vacuum Science & Technology B, 页码：2171-2174 , 文章类型： Article，,卷期：2007年25-6] The fabrication of three-dimensional (3D) structures was demonstrated by proton beam writing (PBW) using a MeV light-ion microbeam system at Japan Atomic Energy Agency. The fabrication of the 3D structures was performed ... Focused ion beam iodine-enhanced etching of high aspect ratio holes in InP photonic crystals [作者：Callegari, V; Nellen, PM; Kaufmann, J; Strasser, P; Robin, F,期刊：Journal Of Vacuum Science & Technology B, 页码：2175-2179 , 文章类型： Article，,卷期：2007年25-6] The authors investigate the focused ion beam (FIB) fabrication of photonic crystal (PhC) holes in InP combining physical sputtering using 30 keV gallium ions and iodine-enhanced etching at 150 degrees C with a protective... Photopolymerization kinetic study of UV nanoimprint lithography dedicated resists [作者：Voisin, P; Zelsmann, M; Ridaoui, H; Chouiki, M; Gourgon, C; Boussey, J; Zahouily, K,期刊：Journal Of Vacuum Science & Technology B, 页码：2384-2387 , 文章类型： Article，,卷期：2007年25-6] This article reports on the properties of ultraviolet nanoimprint lithography dedicated imprinting materials. Studied solutions are composed of a diacrylate-based monomer and a variable amount (1%, 2%, and 4% in weight) ... Bilayer metal wire-grid polarizer fabricated by roll-to-roll nanoimprint lithography on flexible plastic substrate [作者：Ahn, SH; Kim, JS; Guo, LJ,期刊：Journal Of Vacuum Science & Technology B, 页码：2388-2391 , 文章类型： Article，,卷期：2007年25-6] The bilayer metal wire-grid polarizer has several advantages over single-layer wire-grid polarizer and conventional polarizer since it provides higher polarization efficiency and can be easily fabricated. In this work, t... Impact of glass temperature for thermal nanoimprint [作者：Scheer, HC; Bogdanski, N; Wissen, M; Mollenbeck, S,期刊：Journal Of Vacuum Science & Technology B, 页码：2392-2395 , 文章类型： Article，,卷期：2007年25-6] To address the importance of the parameter glass transition temperature T-g for the choice of an adequate process temperature in a thermal nanoimprint process, three polymers with different values of T-g were investigate... Characterizing nanoimprint profile shape and polymer flow behavior using visible light angular scatterometry [作者：Al-Assaad, RM; Regonda, S; Tao, L; Pang, SW; Hu, WW,期刊：Journal Of Vacuum Science & Technology B, 页码：2396-2401 , 文章类型： Article，,卷期：2007年25-6] The profile shape and the flow behavior of polymer nanoscale gratings made by a thermal nanoimprint process are precisely examined using visible light angular scatterometry. Nanoimprinted poly(methyl methacrylate) (PMMA)... Exploring the manufacturability of using block copolymers as resist materials in conjunction with advanced lithographic tools [作者：Craig, GSW; Nealey, PF,期刊：Journal Of Vacuum Science & Technology B, 页码：1969-1975 , 文章类型： Article，,卷期：2007年25-6] The authors discuss studies of the capabilities and advantages of using self-assembling block copolymers in the lithographic process. Directing the assembly of these materials on lithographically defined chemically nanop... Submicron aligned wafer bonding via capillary forces [作者：Tupek, MR; Turner, KT,期刊：Journal Of Vacuum Science & Technology B, 页码：1976-1981 , 文章类型： Article，,卷期：2007年25-6] Submicron wafer-to-wafer alignment is critical in wafer bonding for the fabrication of three-dimensional integrated circuits. In this work, the authors examine the sources of misalignment in traditional alignment methods... Creation of sub-20-nm contact using diblock copolymer on a 300 mm wafer for complementary metal oxide semiconductor applications [作者：Li, WK; Yang, S,期刊：Journal Of Vacuum Science & Technology B, 页码：1982-1984 , 文章类型： Article，,卷期：2007年25-6] The authors have demonstrated a method to form 20 nm contact features of uniform size over a large area by integrating a self-assembling diblock copolymer with optical lithography. The diblock copolymer contacts are form... Deposition of carbonaceous structures using focused Au and Si ion-beam-induced chemical vapor deposition methods [作者：Okada, R; Yo, T; Yanagisawa, J; Matsui, S,期刊：Journal Of Vacuum Science & Technology B, 页码：2180-2183 , 文章类型： Article，,卷期：2007年25-6] Focused ion-beam-induced chemical vapor deposition (FIB-CVD) using Au or Si ions and phenanthrene as a precursor gas was performed to obtain carbon-related materials containing no Ga elements. It was confirmed that narro... Membrane folding by helium ion implantation for three-dimensional device fabrication [作者：Arora, WJ; Sijbrandij, S; Stern, L; Notte, J; Smith, HI; Barbastathis, G,期刊：Journal Of Vacuum Science & Technology B, 页码：2184-2187 , 文章类型： Article，,卷期：2007年25-6] The authors demonstrate that silicon nitride membranes can be folded out of plane into three-dimensional structures by helium ion implantation. The folds have a radius of 1 mu m and can be directed both up or down by var... Design studies for a high brightness, energetic neutral atom source for proximity lithography [作者：Guo, HJ; Craver, B; Reynolds, J; Wolfe, JC,期刊：Journal Of Vacuum Science & Technology B, 页码：2188-2191 , 文章类型： Article，,卷期：2007年25-6] Line-edge roughness due to mask and wafer charging in ion beam proximity lithography can be simply and completely eliminated by neutralizing the ions before they reach the mask. This dramatically increases the usable dep...