Exploring the manufacturability of using block copolymers as resist materials in conjunction with advanced lithographic tools

[摘要]：The authors discuss studies of the capabilities and advantages of using self-assembling block copolymers in the lithographic process. Directing the assembly of these materials on lithographically defined chemically nanopatterned surfaces offers the potential to improve the dimensional control of features at the nanoscale while retaining essential attributes of the lithographic process, such as registration, patterning of regular fabric architectures, and a high degree of pattern perfection. (c) 2007 American Vacuum Society.

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