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  • Reactive solid-state dewetting of Cu-Ni films on silicon
    [作者:Clearfield, R; Railsback, JG; Pearce, RC; Hensley, DK; Fowlkes, JD; Fuentes-Cabrera, M; Simpson, ML; Rack, PD; Melechko, AV,期刊:Applied Physics Letters, 页码:253101-253101 , 文章类型: Article,,卷期:2010年97-25]
  • The behavior of a 50 nm Cu-Ni alloy film on Si in a process of reactive solid-state dewetting is presented. The films were annealed at a range of temperatures (300-700 degrees C) in 1% H-2 99% N-2 reducing atmosphere. Th...