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[摘要]:The variation of optical reflectance from silicon thin films in response to a change in temperature, i.e., the thermoreflectance, was used to monitor heat conduction processes within the films and confirm reduction of their in-plane thermal conductivity with decreasing film thickness. The measurements were also fit to numerical solutions of the heat conduction equation through which it was found that observed conductivity values were consistent with predictions based on phonon dispersion and phonon-boundary scattering considerations. The methods used may have practical implications for monitoring heat dissipation in silicon-on-insulator based microdevices. (C) 2010 American Institute of Physics. [doi:10.1063/1.3527966] |
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