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  • Pressure-Mediated Doping in Graphene
    [作者:Nicolle, J; Machon, D; Poncharal, P; Pierre-Louis, O; San-Miguel, A,期刊:Nano Letters, 页码:3564-3568 , 文章类型: Article,,卷期:2011年11-9]
  • Exfoliated graphene and few layer graphene samples supported on SiO2 have been studied by Raman spectroscopy at high pressure. For samples immersed on a alcohol mixture, an electron transfer of partial derivative n/parti...
  • Carbon Nanotube Field Effect Transistors with Suspended Graphene Gates
    [作者:Svensson, J; Lindahl, N; Yun, H; Seo, M; Midtvedt, D; Tarakanov, Y; Lindvall, N; Nerushev, O; Kinaret, J; Lee, S; Campbell, EEB,期刊:Nano Letters, 页码:3569-3575 , 文章类型: Article,,卷期:2011年11-9]
  • Novel field effect transistors with suspended graphene gates are demonstrated. By incorporating mechanical motion of the gate electrode, it is possible to improve the switching characteristics compared to a static gate, ...
  • Electronic Excited States in Bilayer Graphene Double Quantum Dots
    [作者:Volk, C; Fringes, S; Terres, B; Dauber, J; Engels, S; Trellenkamp, S; Stampfer, C,期刊:Nano Letters, 页码:3581-3586 , 文章类型: Article,,卷期:2011年11-9]
  • We report tunneling spectroscopy experiments on a bilayer graphene double quantum dot device that can be tuned by all-graphene lateral gates. The diameter of the two quantum dots are around 50 nm and the constrictions ac...
  • Graphene Transistors Are Insensitive to pH Changes in Solution
    [作者:Fu, WY; Nef, C; Knopfrnacher, O; Tarasov, A; Weiss, M; Calame, M; Schonenberger, C,期刊:Nano Letters, 页码:3597-3600 , 文章类型: Article,,卷期:2011年11-9]
  • We observe very small gate-voltage shifts in the transfer characteristic of as-prepared graphene field-effect transistors (GFETs) when the pH of the buffer is changed. This observation is in strong contrast to Si-based i...
  • Bistable Charge Configuration of Donor Systems near the GaAs(110) Surfaces
    [作者:Teichmann, K; Wenderoth, M; Loth, S; Garleff, JK; Wijnheijmer, AP; Koenraad, PM; Ulbrich, RG,期刊:Nano Letters, 页码:3538-3542 , 文章类型: Article,,卷期:2011年11-9]
  • In gated semiconductor devices, the space charge layer that is located under the gate electrode acts as the functional element. With increasing gate voltage, the microscopic process forming this space charge layer involv...
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