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Dehydrogenation Reactions during Atomic Layer Deposition of Ru Using O-2

  作者 LEICK N; AGARWAL S; MACKUS A J M; KESSELS W M M  
  选自 期刊  Chemistry of Materials;  卷期  2012年24-19;  页码  3696-3700  
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[摘要]The surface reactions during the atomic layer deposition (ALD) of Ru using an organometallic precursor [CpRu(CO)(2)Et] and O-2 gas were studied using quadrupole mass spectrometry. The analysis of the gas phase species showed that the surface chemisorption of CpRu(CO)(2)Et resulted in the formation of combustion products such as CO2, CO, and H2O. Additionally, H-2 was detected as a major surface reaction product during the metal pulse. Strikingly, during the O-2 pulse virtually no H2O or other H-containing reaction products were measured. The key conclusion of these observations is that dehydrogenation reactions occur on the Ru surface, resulting in the release of a large fraction of the precursor's hydrogen, predominantly in the form of H-2. On the basis of the catalysis literature, we infer that dehydrogenation reactions can also occur during other noble metal ALD processes.

 
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