个性化文献订阅>期刊> Journal Of Vacuum Science & Technology B
 

High performance platinum-silicided p-type Schottky barrier metal-oxide-semiconductor field-effect transistors scaled down to 30 nm - art. no. 032211

  作者 Jun, M; Park, Y; Hyun, Y; Zyung, T; Jang, M; Choi, SJ  
  选自 期刊  Journal Of Vacuum Science & Technology B;  卷期  2011年29-3;  页码  32211-32211  
  关联知识点  
 

[摘要]Platinum-silicided p-type Schottky barrier metal-oxide-semiconductor field-effect-transistors with sizes varying from 350 to 30 nm were fabricated on silicon-on-insulator substrates. Threshold voltage, subthreshold swing, drain-induced barrier lowering, a

 
      被申请数(0)  
 

[全文传递流程]

一般上传文献全文的时限在1个工作日内