Electrical characteristics of Ti-Ta-O based MIM capacitors - art. no. 01AC01

[摘要]：Amorphous Ti-Ta-O thin films were deposited by the atomic-vapor deposition technique for metal-insulator-metal (MIM) applications. Depositions were carried out at 400 C on 200-mm Si (100) wafers using TiN and TaN as bottom electrode materials. The compari

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