Structural and electrical properties of TixAl1-xOy thin films grown by atomic layer deposition - art. no. 01A302

[摘要]：Ternary oxide TixAl1-xOy thin films with a wide Ti/Al ratio have been grown by atomic layer deposition technique. As grown titanium aluminate films are shown to be a homogeneous alloy and exhibit the amorphous structure in the whole compositional range, w

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