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Batch Fabrication of High-Performance Planar Patch-Clamp Devices in Quartz

  作者 Nagarah, JM; Paek, E; Luo, Y; Wang, P; Hwang, GS; Heath, JR  
  选自 期刊  ADVANCED MATERIALS;  卷期  2010年22-41;  页码  4622-4627  
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[摘要]The success of the patch-clamp technique has driven an effort to create wafer-based patch-clamp platforms. We develop a lithographic/electrochemical processing scheme that generates ultrasmooth, high aspect ratio pores in quartz. These devices achieve gigaohm seals in nearly 80% of trials, with the majority exhibiting seal resistances from 20-80 G Omega, competing with pipette-based patch-clamp measurements.

 
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