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High-Pressure Chemical Deposition for Void-Free Filling of Extreme Aspect Ratio Templates

  作者 Baril, NF; Keshavarzi, B; Sparks, JR; Krishnamurthi, M; Temnykh, I; Sazio, PJA; Peacock, AC; Borhan, A; Gopalan, V; Badding, JV  
  选自 期刊  ADVANCED MATERIALS;  卷期  2010年22-41;  页码  4605-4611  
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[摘要]Near atomically smooth, void-free, centimeter-long amorphous silicon waveguides are produced by high pressure chemical fluid deposition in the pores of a microstructured optical fiber template (right inset). Semiconductor waveguides fabricated by conventional deposition/fabrication approaches have a surface roughness that is a constraining factor in most optoelectronic devices, but these waveguides conform to the extraordinarily geometrically perfect optical fiber pores (DIC image, bottom inset).

 
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