UV-LIGA microfabrication of 220 GHz sheet beam amplifier gratings with SU-8 photoresists

[摘要]：Microfabrication techniques have been developed using ultraviolet photolithography (UV-LIGA) with SU-8 photoresists to create advanced sheet beam amplifier circuits for the next generation of vacuum electron traveling wave amplifiers in the 210-220 GHz (G

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