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Impact of ion implantation boundary dimensionality on boron transient diffusion in submicron scale patterns

  作者 Woon, WY; Chen, CL  
  选自 期刊  Applied Physics Letters;  卷期  2010年97-12;  页码  121907-121907  
  关联知识点  
 

[摘要]We investigate two-dimensional boron transient diffusion in sub-micron scale patterns by plane view scanning capacitance microscopy (SCM). Submicron long strips and squares ion implantation windows of systematically varying sizes have been designed and fa

 
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