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Reliability in room-temperature negative differential resistance characteristics of low-aluminum content AlGaN/GaN double-barrier resonant tunneling diodes

  作者 Bayram, C; Vashaei, Z; Razeghi, M  
  选自 期刊  Applied Physics Letters;  卷期  2010年97-18;  页码  181109-181109  
  关联知识点  
 

[摘要]AlGaN/GaN resonant tunneling diodes (RTDs), consisting of 20% (10%) aluminum-content in double-barrier (DB) active layer, were grown by metal-organic chemical vapor deposition on freestanding polar (c-plane) and nonpolar (m-plane) GaN substrates. RTDs wer

 
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