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[摘要]：Electrically conducting films were synthesized, at room temperature, by plasma enhanced chemical vapor deposition (PECVD) of a mixture of tetramethyltin (TMT) and oxygen. The chemical composition of the films were strongly dependent on the partial pressures of the two monomers, total reactor pressure, and on RF power input. At higher TMT to O-2 ratios, nonconductive polymer-like films were produced. As the relative proportion of O-2 to TMT and power input were both increased, a modest reduction in carbon content of the films is observed, but a dramatic increase in film conductivity is observed, ultimately attaining a value of 1 x 10(4) S/cm. Although there are relatively small changes in the overall Sn, O, and C atom percents, with changes in these variables, notable changes in atomic bonding and surface morphologies were observed, as documented by XPS and SEM analyses. In particular, increasing film conductivity can be associated with formation of Sn-Sn bonded moieties, coupled with increasing agglomeration of initially formed nanoparticles into an interconnecting, nodular like structure. Additionally, both these effects become increasingly prominent with increasing film thickness. An important distinguishing feature of the present work, with prior studies, is that this high electrically conductive, nondoped, tin-containing film is obtained entirely at low temperature, as no post plasma thermal heat treatment was employed. |
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