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One-Step Direct-Patterning Template Utilizing Self-Assembly of POSS-Containing Block Copolymers

  作者 Hirai, T; Leolukman, M; Liu, CC; Han, E; Kim, YJ; Ishida, Y; Hayakawa, T; Kakimoto, M; Nealey, PF; Gopalan, P  
  选自 期刊  ADVANCED MATERIALS;  卷期  2009年21-43;  页码  4334-4334  
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[摘要]We report the self-assembly of organic-inorganic block copolymers (BCP) in thin-films by simple solvent annealing on unmodified substrates. The resulting vertically oriented lamellae and cylinders are converted to a hard silica mask by single-step, highly selective oxygen plasma etching. The size of the resulting nanostructures in the case of cylinders is less than 10 nm.

 
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