Robust Pattern Transfer of Nanoimprinted Features for Sub-5-nm Fabrication

[摘要]：We explore the limits of a simple and facile process for transferring low aspect ratio, high-resolution features defined by nanoimprint lithography. The process involves postimprint deposition of an angle-evaporated hard mask. This widens the process wind

[全文传递流程]：

一般上传文献全文的时限在1个工作日内