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Band alignment and electron traps in Y2O3 layers on (100)Si

  作者 Wang, WC; Badylevich, M; Afanas'ev, VV; Stesmans, A; Adelmann, C; Van Elshocht, S; Kittl, JA; Lukosius, M; Walczyk, C; Wenger, C  
  选自 期刊  Applied Physics Letters;  卷期  2009年95-13;  页码  132903-132903  
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[摘要]Y2O3 films deposited by atomic vapor deposition on (100)Si with a 2 or 5 nm thick pregrown thermal SiO2 are investigated as possible charge trapping layers. Analysis of these structures using spectroscopic ellipsometry, photoconductivity, and internal pho

 
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