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[摘要]：Accurate three-dimensional microstructures on silicon or other substrates are becoming increasingly important for optical, electronic, biomedical and medical applications. Traditional microfabrication processes based on cleanroom lithography and dry or wet etching processes are essentially two-dimensional methods. In the past, complicated procedures were designed to create some three-dimensional microstructures; however, these processes were mainly used to create features on planar silicon wafer substrates using the bulk silicon machining technique. In a major departure from previous micromachining processes, a microfabrication process based on microlens projection is presented in this paper. The proposed microfabrication system will have the capabilities of a typical conventional micromachining process plus the unique true three-dimensional replication features based on microlenses that were created on a steep curved substrate. These microlenses were precisely fabricated with a specific pattern on the curved surface that can be used to create microstructures on a pre-defined nonplanar substrate where a layer of photoresist was spin coated. After proper exposure and development, the desired micro patterns are created on the photoresist layer. These micro features can eventually be replicated on the substrate via wet or dry etching processes. The results show that the fabricated three-dimensional microlens array has very high dimensional accuracy and the profile error is less than 6 mu m over the entire surface. |
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