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Insights into electrical characteristics of silicon doped hafnium oxide ferroelectric thin films - art. no. 082905

  作者 Zhou, DY; Muller, J; Xu, J; Knebel, S; Brauhaus, D; Schroder, U  
  选自 期刊  Applied Physics Letters;  卷期  2012年100-8;  页码  82905-82905  
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[摘要]Silicon doped hafnium oxide thin films were recently discovered to exhibit ferroelectricity. In the present study, metal-ferroelectric-metal capacitors with Si:HfO2 thin films as ferroelectric material and TiN as electrodes have been characterized with re

 
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