个性化文献订阅>期刊> Applied Physics Letters
 

Suppression of ambipolar behavior in metallic source/drain metal-oxide-semiconductor field-effect transistors

  作者 Ghoneim, H; Knoch, J; Riel, H; Webb, D; Bjork, MT; Karg, S; Lortscher, E; Schmid, H; Riess, W  
  选自 期刊  Applied Physics Letters;  卷期  2009年95-21;  页码  213504-213504  
  关联知识点  
 

[摘要]We present a study on suppressing the ambipolar behavior of Schottky barrier metal-oxide-semiconductor field-effect transistors (MOSFET). Inserting a silicon nitride layer of appropriate thickness between the metallic source/drain electrodes and the silic

 
      被申请数(0)  
 

[全文传递流程]

一般上传文献全文的时限在1个工作日内