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Surface Loss in Ozone-Based Atomic Layer Deposition Processes

  作者 KNOOPS HARM C M; ELAM JEFFREY W; LIBERA JOSEPH A; KESSELS WILHELMUS M M  
  选自 期刊  Chemistry of Materials;  卷期  2011年23-9;  页码  2381-2387  
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[摘要]The recombinative surface loss of O-3 was investigated and its effects on the initial growth, film uniformity, and film conformality in atomic layer deposition (ALD) processes were illustrated. To determine O-3 recombination probabilities over a wide rang

 
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