个性化文献订阅>期刊> Applied Physics Letters
 

Measurement of effective electron mass in biaxial tensile strained silicon on insulator

  作者 Feste, SF; Schapers, T; Buca, D; Zhao, QT; Knoch, J; Bouhassoune, M; Schindlmayr, A; Mantl, S  
  选自 期刊  Applied Physics Letters;  卷期  2009年95-18;  页码  182101-182101  
  关联知识点  
 

[摘要]We present measurements of the effective electron mass in biaxial tensile strained silicon on insulator (SSOI) material with 1.2 GPa stress and in unstrained SOI. Hall-bar metal oxide semiconductor field effect transistors on 60 nm SSOI and SOI were fabri

 
      被申请数(0)  
 

[全文传递流程]

一般上传文献全文的时限在1个工作日内