SiN membranes with submicrometer hole arrays patterned by wafer-scale nanosphere lithography - art. no. 021012

[摘要]：In this work, nanosphere lithography was integrated with standard microfabrication for the wafer-scale fabrication of silicon nitride (SiN) membranes with arrays of submicrometer holes. A monolayer of polystyrene (PS) beads with a mean diameter of 428 or

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