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Low-temperature field-effect and magnetotransport properties in a ZnO based heterostructure with atomic-layer-deposited gate dielectric - art. no. 241905

  作者 Tsukazaki, A; Ohtomo, A; Chiba, D; Ohno, Y; Ohno, H; Kawasaki, M  
  选自 期刊  Applied Physics Letters;  卷期  2008年93-24;  页码  41905-41905  
  关联知识点  
 

[摘要]A top-gate field-effect device with atomic-layer-deposited Al2O3 dielectric was fabricated to investigate magnetotransport properties of two-dimensional electron gas (2DEG) at a semi-insulating ZnO-Mg0.12Zn0.88O double heterostructure grown by laser molec

 
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