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Site-controlled InAs quantum dots grown on a 55 nm thick GaAs buffer layer

  作者 Pfau, TJ; Gushterov, A; Reithmaier, JP; Cestier, I; Eisenstein, G; Linder, E; Gershoni, D  
  选自 期刊  Applied Physics Letters;  卷期  2009年95-24;  页码  243106-243106  
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[摘要]We present site-controlled low density InAs quantum dots grown by molecular beam epitaxy with a template based overgrowth technique allowing enlarged buffer layers upto 55 nm. Growing a seeding layer of InAs quantum dots in etched holes reduces closing of

 
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