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[摘要]：Highly crystalline, continuous parallel arrays of CdSe nanowires have been generated through electrodeposition using photoresist templates. Easy soft imprint nanolithography (ESINL) was used to pattern a commercially available photoresist, Norland Optical Adhesive 60 (NOA 60), deposited onto the ITO substrates, prior to electrodeposition. Using the exposed ITO layer as an electrode, a thin film of CdSe was electrodeposited from an electrolyte containing CdCl(2), SeO(2), and HCl on the substrate, and the resist was subsequently removed in an alkaline developer solution. The resulting CdSe nanowires were 100 nm in thickness, 300-500 nm in width, and several centimeters in length. Imprinted templates were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM), selected area electron diffraction (SAED), and energy-dispersive X-ray spectroscopy (EDX). The SEM analysis confirmed the formation of parallel arrays of nanowires unaffected by the resist lift-off, and the XRD results showed that the CdSe nanowires had a hexagonal structure and that the crystalline structure was unaffected by the photoresist removal. |
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