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Maskless deposition of ZnO films

  作者 Choppali, U; Kougianos, E; Mohanty, SP; Gorman, BP  
  选自 期刊  SOLAR ENERGY MATERIALS AND SOLAR CELLS;  卷期  2011年95-3;  页码  870-876  
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[摘要]Maskless Mesoscale Materials Deposition (M(3)D (TM)) is a new direct write technique, which is versatile enough to deposit a large variety of precursors and colloidal suspensions. It is a simple and convenient process for rapid prototyping of structures and components. This maskless deposition method operates in air and at room temperature. In this study, a glycerol based polymeric precursor was used for depositing ZnO thin films on surface modified glass substrates. The parameters for deposition using M(3)D (TM) were thoroughly examined and optimized. (C) 2010 Elsevier B.V. All rights reserved.

 
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