In situ studies of Al2O3 and HfO2 dielectrics on graphite

[摘要]：Deposition of Al2O3 and HfO2 dielectrics on graphite is studied as a route to the formation of a high-kappa dielectric on graphene. Electron beam evaporation of metal Al and Hf is followed by a separate oxidation step. Reactive e-beam deposition of HfO2 b

[全文传递流程]：

一般上传文献全文的时限在1个工作日内