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Optoelectronic Gate Dielectrics for High Brightness and High-Efficiency Light-Emitting Transistors

  作者 Namdas, EB; Hsu, BY; Yuen, JD; Samuel, IDW; Heeger, AJ  
  选自 期刊  ADVANCED MATERIALS;  卷期  2011年23-20;  页码  2353-2353  
  关联知识点  
 

[摘要]The optoelectronic gate light-emitting field-effect transistor (OEG LEFET) containing alternate SiO(2) and SiN(x) dielectric stacks allows enhanced light emission for a designed spectrum range and provides reliable strength for a wide operating voltage. The device can improve the emission efficiency by 4.5 times in comparison to a reference LEFET with a SiN(x) gate dielectric and can reach a brightness as high as 4500 cd/m(2).

 
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