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Negative-bias-temperature-instability and hot carrier effects in nanowire junctionless p-channel multigate transistors - art. no. 083504

  作者 Park, JT; Kim, JY; Colinge, JP  
  选自 期刊  Applied Physics Letters;  卷期  2012年100-8;  页码  83504-83504  
  关联知识点  
 

[摘要]Negative-bias-temperature-instability (NBTI) and hot-carrier induced device degradation have been experimentally compared between accumulation mode (AM) p-channel multigate transistors (pMuGFETs) and junctionless (JL) pMuGFET. NBTI degradation is less sig

 
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