Ultradeep fused silica glass etching with an HF-resistant photosensitive resist for optical imaging applications - art. no. 035011

[摘要]：Microfluidic and optical sensing platforms are commonly fabricated in glass and fused silica (quartz) because of their optical transparency and chemical inertness. Hydrofluoric acid (HF) solutions are the etching media of choice for deep etching into sili

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