Optimizing photon sieves to approach Fresnel diffraction limit via pixel-based inverse lithography - art. no. 041002

[摘要]：This article presents a novel, rigorous method to construct photonic sieves whose imaging resolution approaches the Fresnel diffraction limit. Photon sieves (PS), which use holes in place of Fresnel Zone Plate (FZP) as diffractive elements, offer many adv

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