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Electrical stress-induced instability of amorphous indium-gallium-zinc oxide thin-film transistors under bipolar ac stress

  作者 Lee, S; Jeon, K; Park, JH; Kim, S; Kong, D; Kim, DM; Kim, DH; Kim, S; Kim, S; Hur, J; Park, JC; Song, I; Kim, CJ; Park, Y; Jung, UI  
  选自 期刊  Applied Physics Letters;  卷期  2009年95-13;  页码  132101-132101  
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[摘要]Bipolar ac stress-induced instability of amorphous indium-gallium-zinc oxide (a-IGZO) thin-film transistors is comparatively investigated with that under a positive dc gate bias stress. While the positive dc gate bias stress-induced threshold voltage shif

 
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