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On the interface state density at In0.53Ga0.47As/oxide interfaces

  作者 Brammertz, G; Lin, HC; Caymax, M; Meuris, M; Heyns, M; Passlack, M  
  选自 期刊  Applied Physics Letters;  卷期  2009年95-20;  页码  202109-202109  
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[摘要]The authors model the capacitance-voltage (CV) behavior of In0.53Ga0.47As metal-oxide-semiconductor (MOS) structures and compare the results to experimental CV-curves. Due to the very low conduction band density of states, ideal III-V MOS structures shoul

 
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