Two stage ion beam figuring and smoothening method for shape error correction of ULE (R) substrates of extreme ultraviolet lithography projection optics: Evaluation of high-spatial frequency roughness

[摘要]：The ULE (R) substrates used in projection optics of extreme ultraviolet lithography (EUVL) tools are mechanically prefinished with shape accuracy of several nanometer rms (specification: under 0.15 nm rms) with high-spatial frequency roughness (HSFR) (spa

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