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Understanding the base development mechanism of hydrogen silsesquioxane

  作者 Kim, J; Chao, WL; Griedel, B; Liang, XG; Lewis, M; Hilken, D; Olynick, D  
  选自 期刊  Journal Of Vacuum Science & Technology B;  卷期  2009年27-6;  页码  2628-2634  
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[摘要]The authors study the dissolution mechanism of hydrogen silsesquioxane in base solutions with the addition of chloride salts to elucidate the development mechanism. The reaction mechanisms are proposed based on the dissolution mechanism of quartz. Develop

 
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