Formation of an extended CoSi2 thin nanohexagons array coherently buried in silicon single crystal - art. no. 063116

[摘要]：A Co-doped silica film was deposited on the surface of a Si(100) wafer and isothermally annealed at 750 degrees C to form spherical Co nanoparticles embedded in the silica film and a few atomic layer thick CoSi2 nanoplatelets within the wafer. The structu

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