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CH spectroscopy for carbon chemical erosion analysis in high density low temperature hydrogen plasma

  作者 Westerhout, J; Cardozo, NJL; Rapp, J; van Rooij, GJ  
  选自 期刊  Applied Physics Letters;  卷期  2009年95-15;  页码  151501-151501  
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[摘要]The CH A-X molecular band is measured upon seeding the hydrogen plasma in the linear plasma generator Pilot-PSI [electron temperature T-e=0.1-2.5 eV and electron density n(e)=(0.5-5) X 10(20) m(-3)] with methane. Calculated inverse photon efficiencies for

 
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