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Kinetics of a transient silicide during the reaction of Ni thin film with (100)Si

  作者 Mangelinck, D; Hoummada, K; Blum, I  
  选自 期刊  Applied Physics Letters;  卷期  2009年95-18;  页码  181902-181902  
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[摘要]In situ measurements of the kinetics of the transient theta-Ni2Si phase formation have been obtained by x-ray diffraction and differential scanning calorimetry. A possible mechanism for the transient phase is proposed. It allows to simulate the growth and

 
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