【文章名】Interdependence of optimum exposure dose regimes and the kinetics of resist dissolution for electron beam nanolithography of polymethylmethacrylate
[摘要]:The authors report a systematic experimental study of dense nanostructures in polymethylmethacrylate (PMMA) created by low-energy electron beam lithography (EBL) with varying duration and temperature of the resist dissolution. They observe that decreasing