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Near band edge Schottky barrier height modulation using high-kappa dielectric dipole tuning mechanism

  作者 Coss, BE; Loh, WY; Wallace, RM; Kim, J; Majhi, P; Jammy, R  
  选自 期刊  Applied Physics Letters;  卷期  2009年95-22;  页码  222105-222105  
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[摘要]Schottky barrier height tuning using high-kappa/SiO2 interfacial dipoles is reported. Schottky barrier heights of 1.0 and 0.2 eV are observed in a TaN/p-Si diode by insertion of thin layers of high-kappa (LaOx,AlOx) and SiO2 at the metal-semiconductor int

 
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