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Graphite based Schottky diodes formed on Si, GaAs, and 4H-SiC substrates

  作者 Tongay, S; Schumann, T; Hebard, AF  
  选自 期刊  Applied Physics Letters;  卷期  2009年95-22;  页码  222103-222103  
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[摘要]We demonstrate the formation of semimetal graphite/semiconductor Schottky barriers where the semiconductor is either silicon (Si), gallium arsenide (GaAs), or 4H-silicon carbide (4H-SiC). Near room temperature, the forward-bias diode characteristics are w

 
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