[摘要]：The fabrication of electronic devices on flexible substrates represents an opportunity for the development of flexible display technologies, large area devices, and roll-to-roll manufacturing processes. Traditional photolithography encounters alignment and overlay limitations when applied to flexible substrates. One solution to the overlay challenges is imaging of two device layers in a single lithographic exposure. To enable the simultaneous patterning of two device layers, a new photoresist system was developed. Prior work on dual-tone photoresists introduced formulations capable of storing two independent images, but the reported systems are incompatible with the reactive ion etch processes commonly used today. This paper describes a dual-tone photoresist system that maintains the ability to store two independent latent images, distinguished by the incident exposure light wavelength, simultaneously remaining compatible with reactive ion etch image transfer processes. (C) 2012 American Vacuum Society. [DOI: 10.1116/1.3669380]
