[摘要]：A novel way to immobilize deoxyribonucleic acid (DNA) origami on a conventional substrate using hydrogen silsesquioxane (HSQ) as a functionalized platform is demonstrated. An alternative approach to quantifying roughness of the HSQ surfaces for 2D DNA origami immobilization is also introduced. Effects of oxygen plasma treatment on the surface roughness and functionalization (for DNA origami immobilization) of exposed and developed HSQ patterns are characterized. Surface root mean square roughness of electron-beam exposed HSQ with various thicknesses is investigated and optimized down to 0.2 nm for ultrathin (sub-15 nm) HSQ patterns. (C) 2012 American Vacuum Society. [DOI: 10.1116/1.3676054]
