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Fabrication of two-dimensional superposed microstructure by interference lithography

  作者 Lu, H; Zhao, QL; Zhang, QY; Niu, DJ; Wang, X  
  选自 期刊  APPLIED OPTICS;  卷期  2012年51-3;  页码  302-305  
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[摘要]In this paper, we report the basic theory and method of single exposure interference lithography (IL) to fabricate two-dimensional (2D) superposed microstructures. Distribution of six-beam interference intensities with different azimuth angle is discussed, and 2D superposed microstructures with different periodic constants are obtained by computer simulations. The experiment results using CHP-C positive photoresist show a 2D superposed photonic crystal composed of a periodically repeated hexagonal pattern of hexagonal lattice cells, which is in close agreement with the computer simulation. Fabrication of a superposed structure by single exposure IL paves the way for studying 2D photonic crystal fabrication, surface lasing, optical waveguides, and so on. (C) 2012 Optical Society of America

 
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